Etch stop techniques for micromachining

被引：47

作者：

Collins, SD

机构：

[1] Damien Associates, Davis

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1997年 / 144卷 / 06期

关键词：

D O I：

10.1149/1.1837773

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

A presentation of etch stop engineering is presented with a review of the present state of the art in etch stop micromachining. This review assumes a global definition for an etch stop and focuses on salient examples of common etch stop techniques, as well as unique and/or novel etch stop methods. A table of representative etch stops is also presented as a summary.

引用

收藏

页码：2242 / 2262

页数：21

相关论文

共 380 条

[71] FABRICATION OF CATHETER-TIP AND SIDEWALL MINIATURE PRESSURE SENSORS [J].

ESASHI, M ;

KOMATSU, H ;

MATSUO, T ;

TAKAHASHI, M ;

TAKISHIMA, T ;

IMABAYASHI, K ;

OZAWA, H .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1982, 29 (01) :57-63

[72] PERFORMANCE IMPROVEMENT OF CIRCULAR-GRATING SURFACE-EMITTING DBR LASERS USING AN MQW STRUCTURE WITH ETCH-STOP LAYER [J].

FALLAHI, M ;

DION, M ;

WASILEWSKI, Z ;

BUCHANAN, M ;

NOURNIA, M ;

STAPLEDON, J ;

BARBER, R .

ELECTRONICS LETTERS, 1995, 31 (18) :1581-1582

[73] IC-PROCESSED ELECTROSTATIC MICROMOTORS [J].

FAN, LS ;

TAI, YC ;

MULLER, RS .

SENSORS AND ACTUATORS, 1989, 20 (1-2) :41-47

[74] INTEGRATED MOVABLE MICROMECHANICAL STRUCTURES FOR SENSORS AND ACTUATORS [J].

FAN, LS ;

TAI, YC ;

MULLER, RS .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1988, 35 (06) :724-730

[75] Photoluminescence and electroluminescence from porous silicon [J].

Fauchet, PM .

JOURNAL OF LUMINESCENCE, 1996, 70 :294-309

[76]

FAUST JW, 1983, J ELECTROCHEM SOC, V130, P1413, DOI 10.1149/1.2119964

[77]

FAUST JW, 1959, SURFACE CHEM METALS, P151

[78] THE ROLE OF THE LATENT IMAGE IN A NEW DUAL IMAGE, AQUEOUS DEVELOPABLE, THERMALLY STABLE PHOTORESIST [J].

FEELY, WE ;

IMHOF, JC ;

STEIN, CM .

POLYMER ENGINEERING AND SCIENCE, 1986, 26 (16) :1101-1104

[79]

FEELY WE, 1986, P SOC PHOTO-OPT INS, V631, P49

[80] EPITAXIAL SI-GE ETCH-STOP LAYERS WITH ETHYLENE DIAMINE PYROCATECHOL FOR BONDED AND ETCHBACK SILICON-ON-INSULATOR [J].

FEIJOO, D ;

BEAN, JC ;

PETICOLAS, LJ ;

FELDMAN, LC ;

LIANG, WC .

JOURNAL OF ELECTRONIC MATERIALS, 1994, 23 (06) :493-496

← 3 4 5 6 7 8 9 10 11 12 →