Nanoimprinting using liquid-phase hydrogen silsesquioxane

被引：20

作者：

Nakamatsu, Ken-ichiro ^{[1
]}

Matsui, Shinji ^{[1
]}

机构：

[1] Univ Hyogo, LASTI, Grad Sch Sci, Ako, Hyogo 6781205, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 2006年 / 45卷 / 20-23期

关键词：

hydrogen silsesquioxane (HSQ); liquid phase; nanoimprint; lithography; low pressure; thin residual layer;

D O I：

10.1143/JJAP.45.L546

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We have newly developed an imprinting technique using liquid-phase hydrogen silsesquioxane (HSQ) as an alternate replication material for spin-coated HSQ resin currently used. Various patterns with linewidth ranging from 25 nm to 300 mu n , were demonstrated by imprinting using liquid-phase HSQ. We simultaneously fabricated arbitrary patterns including both submicron and greater than one hundred micron patterns by a one-step process. Moreover, after imprinting, the residual HSQ layer that remained in the compressed area was less than 10 nm thick.

引用

页码：L546 / L548

页数：3

共 12 条

[1] Imprint lithography with 25-nanometer resolution [J].

Chou, SY ;

Krauss, PR ;

Renstrom, PJ .

SCIENCE, 1996, 272 (5258) :85-87

[2] Sub-10 nm imprint lithography and applications [J].

Chou, SY ;

Krauss, PR ;

Zhang, W ;

Guo, LJ ;

Zhuang, L .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997, 15 (06) :2897-2904

[3] IMPRINT OF SUB-25 NM VIAS AND TRENCHES IN POLYMERS [J].

CHOU, SY ;

KRAUSS, PR ;

RENSTROM, PJ .

APPLIED PHYSICS LETTERS, 1995, 67 (21) :3114-3116

[4] Imprint characteristics by photo-induced solidification of liquid polymer [J].

Komuro, M ;

Taniguchi, J ;

Inoue, S ;

Kimura, N ;

Tokano, Y ;

Hiroshima, H ;

Matsui, S .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2000, 39 (12B) :7075-7079

[5] Fabrication of quantum point contacts by imprint lithography and transport studies [J].

Martini, I ;

Kuhn, S ;

Kamp, M ;

Worschech, L ;

Forchel, A ;

Eisert, D ;

Koeth, J ;

Sijbesma, R .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (06) :3561-3563

[6] Room-temperature nanoimprint and nanotransfer printing using hydrogen silsequioxane [J].

Matsui, S ;

Igaku, Y ;

Ishigaki, H ;

Fujita, J ;

Ishida, M ;

Ochiai, Y ;

Namatsu, H ;

Komuro, M .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (02) :688-692

[7] Room temperature replication in spin on glass by nanoimprint technology [J].

Matsui, S ;

Igaku, Y ;

Ishigaki, H ;

Fujita, J ;

Ishida, M ;

Ochiai, Y ;

Komuro, M ;

Hiroshima, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2001, 19 (06) :2801-2805

[8] Nanoimprint and nanocontact technologies using hydrogen silsesquioxane [J].

Nakamatsu, K ;

Watanabe, K ;

Tone, K ;

Namatsu, H ;

Matsui, S .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2005, 23 (02) :507-512

[9] Bilayer resist method for room-temperature nanoimprint lithography [J].

Nakamatsu, K ;

Watanabe, K ;

Tone, K ;

Katase, T ;

Hattori, W ;

Ochiai, Y ;

Matsuo, T ;

Sasago, M ;

Namatsu, H ;

Komuro, M ;

Matsui, S .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2004, 43 (6B) :4050-4053

[10] Fabrication of a new broadband waveguide polarizer with a double-layer 190 nm period metal-gratings using nanoimprint lithography [J].

Wang, J ;

Schablitsky, S ;

Yu, ZN ;

Wu, W ;

Chou, SY .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (06) :2957-2960

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