Room temperature replication in spin on glass by nanoimprint technology

被引:76
作者
Matsui, S [1 ]
Igaku, Y
Ishigaki, H
Fujita, J
Ishida, M
Ochiai, Y
Komuro, M
Hiroshima, H
机构
[1] Himeji Inst Technol, Lab Adv Sci & Technol, Himeji, Hyogo 6781201, Japan
[2] NEC Corp Ltd, Fundamental Res Labs, Tsukuba, Ibaraki 3058501, Japan
[3] Agcy Ind Sci & Technol, Adv Semicond Res Ctr, Tsukuba, Ibaraki 3058568, Japan
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2001年 / 19卷 / 06期
关键词
D O I
10.1116/1.1417547
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A compact nanoimprint lithography (NIL) system using the driving power of a stepping motor has been developed. Compared to a conventional NIL system with a hydraulic press, there are some additional features of the NIL system such as compactness and low cost. We propose the use of spin on glass (SOG) instead of PMMA to avoid thermal expansion and demonstrate SOG patterns with 200 nm linewidths at room temperature replications using the NIL system. The SOG patterns were transferred to gold metal using liftoff and to a silicon substrate by reactive ion etching. (C) 2001 American Vacuum Society.
引用
收藏
页码:2801 / 2805
页数:5
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