Insight into the epitaxial growth of high optical quality GaAs1-xBix

被引:18
作者
Beaton, D. A. [1 ]
Mascarenhas, A. [1 ]
Alberi, K. [1 ]
机构
[1] Natl Renewable Energy Lab, Golden, CO 80401 USA
关键词
MOLECULAR-BEAM EPITAXY; SEMICONDUCTOR ALLOY GAAS1-XBIX; DILUTE NITRIDES; GAAS; AS-4; SB;
D O I
10.1063/1.4937574
中图分类号
O59 [应用物理学];
学科分类号
070305 [高分子化学与物理];
摘要
The ternary alloy GaAs1-xBix is a potentially important material for infrared light emitting devices, but its use has been limited by poor optical quality. We report on the synthesis of GaAs1-xBix epilayers that exhibit narrow, band edge photoluminescence similar to other ternary GaAs based alloys, e.g., InyGa1-yAs. The measured spectral line widths are as low as 14 meV and 37 meV at low temperature (6 K) and room temperature, respectively, and are less than half of previously reported values. The improved optical quality is attributed to the use of incident UV irradiation of the epitaxial surface and the presence of a partial surface coverage of bismuth in a surfactant layer during epitaxy. Comparisons of samples grown under illuminated and dark conditions provide insight into possible surface processes that may be altered by the incident UV light. The improved optical quality now opens up possibilities for the practical use of GaAs1-xBix in optoelectronic devices. (C) 2015 AIP Publishing LLC.
引用
收藏
页数:8
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