Effects of incident UV light on the surface morphology of MBE grown GaAs

被引:7
作者
Beaton, Daniel A. [1 ]
Sanders, C. [1 ]
Alberi, K. [1 ]
机构
[1] Natl Renewable Energy Lab, 16253 Denver West Pkwy, Golden, CO 80401 USA
关键词
Reflection high energy electron diffraction; Roughening; Surfaces; Molecular beam epitaxy; Semiconducting gallium arsenide; MOLECULAR-BEAM EPITAXY; MIGRATION-ENHANCED EPITAXY; CRYSTAL-GROWTH; II-VI; SEMICONDUCTORS; DEPOSITION; HYDROGEN; FILMS;
D O I
10.1016/j.jcrysgro.2014.12.015
中图分类号
O7 [晶体学];
学科分类号
070301 [无机化学];
摘要
Light-assisted molecular beam epitaxy is a promising technique for improving the growth of metastable semiconductor alloys traditionally grown at low temperatures. The effect of photon irradiation on adatom incorporation dynamics is studied for GaAs homoepitaxy on vicinal surfaces. Irradiation is found to increase the temperature at which the growth mode transitions from layer-by-layer island nucleation to step flow growth and to alter the surface morphology. These surprising changes are discussed in the context of modification of adatom diffusion and incorporation processes. Published by Elsevier B.V.
引用
收藏
页码:76 / 80
页数:5
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