Power scale-up of the extreme ultraviolet electric capillary discharge source

被引：8

作者：

Fornaciari, NR ^{[1
]}

Bender, H ^{[1
]}

Buchenauer, D ^{[1
]}

Dimkoff, J ^{[1
]}

Kanouff, M ^{[1
]}

Karim, S ^{[1
]}

Romeo, C ^{[1
]}

Shimkaveg, G ^{[1
]}

Silfvast, WT ^{[1
]}

Stewart, KD ^{[1
]}

机构：

[1] Sandia Natl Labs, Livermore, CA 94551 USA

来源：

EMERGING LITHOGRAPHIC TECHNOLOGIES VI, PTS 1 AND 2 | 2002年 / 4688卷

关键词：

EUVL; EUV source; plasma discharge source; capillary discharge source;

D O I：

10.1117/12.472282

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Recent development work on the EUV electric capillary discharge source been has focused on two areas: increasing EUV power generation and minimizing debris deposition on plasma facing optics. To achieve high-power operation, a pulser capable of driving the source up to 1.7 kHz and a new high-power lamp have been integrated. An EUV flux of 9 W into pi-sr and a 2% bandwidth has been generated in burst mode at 1000 Hz. Three additional parametric studies are discussed. The first compares the EUV power generation and spectral output for three different capillary materials. The second study compares the source efficiency for 3 nun and 6 nun length capillaries. And the third parametric study measures the EUV output stability over a one million pulse run. The second focus area has been to increase mirror reflectance lifetimes through the further development of the gas curtain debris mitigation approach. A new gas curtain laboratory has been built with more than a I Ox increase in flow capability and a IN reduction in chamber background pressure. Measurements of the gas curtain efficiency have demonstrated a reduction in particulate deposition rate of at least a factor of eighty.

引用

页码：110 / 121

页数：2

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