Development of an electric capillary discharge source

被引：9

作者：

Fornaciari, NR ^{[1
]}

Chang, JJ ^{[1
]}

Folk, DR ^{[1
]}

Gianoulakis, S ^{[1
]}

Goldsmith, JEM ^{[1
]}

Kubiak, GD ^{[1
]}

Long, BC ^{[1
]}

O'Connell, DJ ^{[1
]}

Shimkaveg, G ^{[1
]}

Silfvast, WT ^{[1
]}

Stewart, KD ^{[1
]}

机构：

[1] Sandia Natl Labs, Livermore, CA 94551 USA

来源：

EMERGING LITHOGRAPHIC TECHNOLOGIES IV | 2000年 / 3997卷

关键词：

EUVL; EUV source; plasma discharge source; capillary discharge source;

D O I：

10.1117/12.390047

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We report on the development of an electric capillary discharge source that radiates with comparable efficiency at both 13.5 nm and 11.4 nm, two wavelengths of interest for EW lithography. The discharge source is comprised of a low-pressure, xenon-filled, small diameter capillary tube with electrodes attached to both ends. A high-voltage electric pulse applied across the capillary tube generates an intense plasma that radiates in the EW. This source is capable of producing 7 mJ/steradian per pulse in a 0.3 nm bandwidth centered at 13.4 nm. fn this paper we will address three significant issues related to the successful development of this source: minimization of debris generation, thermal management, and imaging quality.

引用

页码：120 / 125

页数：6

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