Real-time gray-scale photolithography for fabrication of continuous microstructure

被引：35

作者：

Peng, QJ ^{[1
]}

Guo, YK

Liu, SJ

机构：

[1] Sichuan Univ, Inst Informat Opt, Chengdu 610064, Peoples R China

[2] Rutherford Appleton Lab, Didcot OX11 0QX, Oxon, England

来源：

OPTICS LETTERS | 2002年 / 27卷 / 19期

关键词：

D O I：

10.1364/OL.27.001720

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A novel real-time gray-scale photolithography technique for the fabrication of continuous microstructures that uses a LCD panel as a real-time gray-scale mask is presented. The principle of design of the technique is explained, and computer simulation results based on partially coherent imaging theory are given for the patterning of a microlens array and a zigzag grating. An experiment is set up, and a microlens array and a zigzag grating on panchromatic silver halide sensitized gelatin with trypsinase etching are obtained. (C) 2002 Optical Society of America.

引用

页码：1720 / 1722

页数：3

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