SRPES studies of the NO2 reaction with vanadium oxide thin films on TiO2(110)-1 x 1

被引：4

作者：

Chang, ZP

Li, ZS

Udby, L

He, J

Nielsen, TV

Moller, PJ

机构：

[1] Univ Copenhagen, Dept Chem, Chem Lab 4, DK-2100 Copenhagen O, Denmark

[2] Univ Aarhus, Inst Storage Ring Facil, DK-8000 Aarhus, Denmark

[3] Fudan Univ, Dept Phys, Shanghai 200433, Peoples R China

来源：

SURFACE SCIENCE | 2002年 / 505卷 / 1-3期

关键词：

photoelectron spectroscopy; vanadium; vanadium oxide; titanium oxide; single crystal epitaxy; surface structure; morphology; roughness; and topography;

D O I：

10.1016/S0039-6028(02)01067-1

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Synchrotron-radiation-induced photoelectron spectroscopy (SRPES) has been used to investigate the reaction of NO2 over vanadia thin films at different coverages on TiO2(110)-1 x 1. The stoichiometry and structure of the vanadia films are controlled to be VO2, rutile structured, using a previously published non-dioxygen-ambient method of synthesis in UHV. The reactivity of these VO2 films towards NO2 varies with their coverages. The results are interpreted with regard to the surface structure and stoichiometry. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：71 / 80

页数：10

共 41 条

[11] Epitaxial growth and properties of thin film oxides [J].