Aging influence of poly(ethylene glycol) suppressors of Cu electrolytes on gaps filling

被引:4
作者
Liu, Sue-Hong
Li, Tsung-Cheng
Chen, Chih [1 ]
Shieh, Jia-Min
Dai, Bau-Tong
Hensen, Karl
Cheng, Shih-Song
机构
[1] Natl Chiao Tung Univ, Dept Mat Sci & Engn, Hsinchu 30050, Taiwan
[2] Natl Nano Device Labs, Hsinchu 30078, Taiwan
[3] BASF Elect Mat Ltd, Taipei, Taiwan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2006年 / 45卷 / 5A期
关键词
Cu electroplating; suppressor;
D O I
10.1143/JJAP.45.3976
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this study, we investigate how the degradation of poly(ethylene glycol) (PEG) additives in Cu electroplating electrolytes influences the gaps filling of damascene features and the roughness of plated surfaces. The cleavage of PEG, whose reaction is enhanced by a high bias current and more plating cycles, not only diminishes the inhibition effect of the electrolytes, but also enables the formation of enormous complexes of short-chain PEG-Cu far from the reacting surfaces. Hence, the more plating cycles performed, the worse the gaps filling characteristic and the rougher the plated surfaces. Furthermore, an overshoot phenomenon on the transient cells voltage for PEG-containing electrolytes is observed and explained well by a dynamic equilibrium between PEG absorption ability and Cu reduction speed. Accordingly, the change in overshoot shape is closely related to PEG aging and this fact is employed to examine the reliability of electrolytes.
引用
收藏
页码:3976 / 3980
页数:5
相关论文
共 19 条
[1]   Wetting effect on gap filling submicron damascene by an electrolyte free of levelers [J].
Chang, SC ;
Shieh, JM ;
Lin, KC ;
Dai, BT ;
Wang, TC ;
Chen, CF ;
Feng, MS ;
Li, YH ;
Lu, CP .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (04) :1311-1316
[2]  
DIETZ KH, 2000, CIRCUITREE FEB, P22
[3]   An EQCM study of the electrochemical copper-(II)/copper(I)/copper system in the presence of PEG and chloride ions [J].
Doblhofer, K ;
Wasle, S ;
Soares, DM ;
Weil, KG ;
Ertl, G .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2003, 150 (10) :C657-C664
[4]   Evolution of surface roughness during copper electrodeposition in the presence of additives - Comparison of experiments and Monte Carlo simulations [J].
Drews, TO ;
Ganley, JC ;
Alkire, RC .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2003, 150 (05) :C325-C334
[5]   Inhibition due to the interaction of polyethylene glycol, chloride, and copper in plating baths: A surface-enhanced Raman study [J].
Feng, ZV ;
Li, X ;
Gewirth, AA .
JOURNAL OF PHYSICAL CHEMISTRY B, 2003, 107 (35) :9415-9423
[6]   All-metallic three-dimensional photonic crystals with a large infrared bandgap [J].
Fleming, JG ;
Lin, SY ;
El-Kady, I ;
Biswas, R ;
Ho, KM .
NATURE, 2002, 417 (6884) :52-55
[7]   Electrochemical impedance spectroscopy investigation of bath aging in damascene process chemistries [J].
Gabrielli, C ;
Mocoteguy, P ;
Perrot, H ;
Zdunek, A ;
Bouard, P ;
Haddix, M .
ELECTROCHEMICAL AND SOLID STATE LETTERS, 2004, 7 (03) :C31-C34
[8]   Copper bottom-up deposition by breakdown of PEG-Cl inhibition [J].
Hayase, M ;
Taketani, M ;
Aizawa, K ;
Hatsuzawa, T ;
Hayabusa, K .
ELECTROCHEMICAL AND SOLID STATE LETTERS, 2002, 5 (10) :C98-C101
[9]   THE CHEMISTRY OF THE ADDITIVES IN AN ACID COPPER ELECTROPLATING BATH .1. POLYETHYLENE-GLYCOL AND CHLORIDE-ION [J].
HEALY, JP ;
PLETCHER, D ;
GOODENOUGH, M .
JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1992, 338 (1-2) :155-165
[10]   Surface adsorption of PEG and Cl- additives for copper damascene electrodeposition [J].
Jin, Y ;
Kondo, K ;
Suzuki, Y ;
Matsumoto, T ;
Barkey, DP .
ELECTROCHEMICAL AND SOLID STATE LETTERS, 2005, 8 (01) :C6-C8