Effect of group-V species exchange at the interfaces of InGaAs/AlAsSb superlattice

被引:15
作者
Georgiev, N [1 ]
Mozume, T [1 ]
机构
[1] Femtosecond Technol Res Assoc, FESTA, Tsukuba, Ibaraki 30026, Japan
关键词
molecular beam epitaxy; InGaAs/AlAsSb; superlattice;
D O I
10.1016/S0022-0248(99)00549-7
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The effect of growth interruption times combined with selective group-V species exposure of InGaAs/AlAsSb short-period superlattice structure was investigated with photoluminescence, X-ray diffraction, reflection high-energy electron diffraction. X-ray data show no superlattice structural dependence on the used growth treatment. While reflection electron diffraction patterns strongly depend on the exposure time and species type exposure. A shift in the photoluminescence peak position from samples grown under different species type exposure is observed. The samples with Sb- and As-terminated interfaces, respectively, indicate lower- and higher-energy peaks compared to the ones grown without interruption. This is interpreted in terms of increased incorporation of Sb in the InGaAs layer that leads to a change in the quantum well profile. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:247 / 251
页数:5
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