Critical properties of nanoporous low dielectric constant films revealed by Brillouin light scattering and surface acoustic wave spectroscopy

被引:56
作者
Flannery, CM
Wittkowski, T
Jung, K
Hillebrands, B
Baklanov, MR
机构
[1] Paul Drude Inst Festkorperelekt, FG Nanoakust, D-10117 Berlin, Germany
[2] Univ Kaiserslautern, Fachbereich Phys, D-67663 Kaiserslautern, Germany
[3] Univ Kaiserslautern, Schwerpunkt Mat Wissensch, D-67663 Kaiserslautern, Germany
[4] IMEC, XPEQT, B-3001 Louvain, Belgium
关键词
D O I
10.1063/1.1478775
中图分类号
O59 [应用物理学];
学科分类号
摘要
Thin porous films with nanometer pore sizes are the subject of intense interest, primarily because of their reduced dielectric constant k. The lack of useful characterization tools and the reduction in film mechanical properties with increasing porosity have severely hindered their development and application. We show that both Brillouin light scattering and surface acoustic wave spectroscopy allow one to measure density, porosity and stiffness properties of nanoporous methylsilsesquioxane films of low-k value. Excellent correlations are observed among independent measurements of density, porosity and the Young's modulus which show that the results obtained are reliable and reveal properties of the films which are difficult or impossible to obtain using other techniques. (C) 2002 American Institute of Physics.
引用
收藏
页码:4594 / 4596
页数:3
相关论文
共 17 条
  • [1] Achenbach J., 1973, WAVE PROPAGATION ELA
  • [2] Determination of pore size distribution in thin films by ellipsometric porosimetry
    Baklanov, MR
    Mogilnikov, KP
    Polovinkin, VG
    Dultsev, FN
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (03): : 1385 - 1391
  • [3] BAKLANOV MR, 2001, P MRS ADV MET C AMC
  • [4] Characterization of thin-film aerogel porosity and stiffness with laser-generated surface acoustic waves
    Flannery, CM
    Murray, C
    Streiter, I
    Schulz, SE
    [J]. THIN SOLID FILMS, 2001, 388 (1-2) : 1 - 4
  • [5] Supramolecular approaches to nanoscale dielectric foams for advanced microelectronic devices
    Hawker, CJ
    Hedrick, JL
    Miller, RD
    Volksen, W
    [J]. MRS BULLETIN, 2000, 25 (04) : 54 - 58
  • [7] Nanoporous silica as an ultralow-k dielectric
    Jin, CM
    Luttmer, JD
    Smith, DM
    Ramos, TA
    [J]. MRS BULLETIN, 1997, 22 (10) : 39 - 42
  • [8] KAWAMURA S, 2001, P MRS ADV MET C AMC
  • [9] KUSCHNEREIT R, 1995, APPL PHYS A-MATER, V61, P269, DOI 10.1007/BF01538192
  • [10] Comparison of techniques to characterise the density, porosity and elastic modulus of porous low-k SiO2 xerogel films
    Murray, C
    Flannery, C
    Streiter, I
    Schulz, SE
    Baklanov, MR
    Mogilnikov, KP
    Himcinschi, C
    Friedrich, M
    Zahn, DRT
    Gessner, T
    [J]. MICROELECTRONIC ENGINEERING, 2002, 60 (1-2) : 133 - 141