Structure of cobalt cluster films obtained by sputter deposition on alumina

被引:19
作者
Briático, J
Maurice, JL
Carrey, J
Imhoff, D
Petroff, F
Vaurès, A
机构
[1] Thomson CSF, CNRS, Unite Mixte Phys, F-91404 Orsay, France
[2] Univ Paris 11, Phys Solides Lab, F-91405 Orsay, France
关键词
PACS: 61.46.+w Clusters, nanoparticles, and nanocrystalline materials – 61.10.Ht X-ray absorption spectroscopy: EXAFS, NEXAFS, XANES, etc.;
D O I
10.1007/s100530050491
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We report on the structure of cobalt cluster films obtained by aggregation of metal atoms sputter-deposited on amorphous alumina. The cluster layers were encapsulated with a second amorphous alumina layer, also made by sputtering in the same chamber. Electron energy loss spectroscopy (EELS) indicates that encapsulation with sputtered alumina keeps the clusters free from cobalt oxide. Transmission electron microscopy (TEM) exhibits relatively narrow distributions of the cluster sizes and of the inter-cluster distances, which results in a noticeable local order. Size distributions appear quasi-Gaussian, but TEM misses an important number of small particles. Extended X ray absorption fine structure (EXAFS) data shows that the actual average sizes are smaller, and Monte Carlo simulations suggest that the actual distributions could be bimodal, with a secondary peak in the small-size range.
引用
收藏
页码:517 / 521
页数:5
相关论文
共 11 条
[1]  
BRIATICO J, 1998, P 14 INT C EL MICR C
[2]   Metal-based single electron transistors [J].
Chen, W ;
Ahmed, H .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997, 15 (04) :1402-1405
[3]   Point-contact electrodes to probe charging effects in individual ultrasmall cobalt clusters [J].
Desmicht, R ;
Faini, G ;
Cros, V ;
Fert, A ;
Petroff, F ;
Vaures, A .
APPLIED PHYSICS LETTERS, 1998, 72 (03) :386-388
[4]   TEM observations of nanometer thick cobalt deposits in alumina sandwiches [J].
Fettar, F ;
Maurice, JL ;
Petroff, F ;
Schelp, LF ;
Vaures, A ;
Fert, A .
THIN SOLID FILMS, 1998, 319 (1-2) :120-123
[5]   DEPOSITION, DIFFUSION AND AGGREGATION OF ATOMS ON SURFACES - A MODEL FOR NANOSTRUCTURE GROWTH [J].
JENSEN, P ;
BARABASI, AL ;
LARRALDE, H ;
HAVLIN, S ;
STANLEY, HE .
PHYSICAL REVIEW B, 1994, 50 (20) :15316-15329
[6]  
MAURICE JL, UNPUB
[7]  
MAURICE JL, 1999, IN PRESS PHILOS MA A
[8]  
MICHALOWICZ A, 1991, LOGICIELS CHIMIE, P102
[9]   Magnetoresistance of ferromagnetic tunnel junctions with Al2O3 barriers formed by rf sputter etching in Ar/O2 plasma [J].
Nassar, J ;
Hehn, M ;
Vaures, A ;
Petroff, F ;
Fert, A .
APPLIED PHYSICS LETTERS, 1998, 73 (05) :698-700
[10]   Spin-dependent tunneling with Coulomb blockade [J].
Schelp, LF ;
Fert, A ;
Fettar, F ;
Holody, P ;
Lee, SF ;
Maurice, JL ;
Petroff, F ;
Vaures, A .
PHYSICAL REVIEW B, 1997, 56 (10) :R5747-R5750