Rapid flash patterning of nanostructures

Sub-100 nm structures can be fabricated in tens of seconds with an aspect ratio much larger than unity by the general purpose patterning method presented here. A flexible film mold and a rapid flash heating with an infrared lamp are used in this nonphotolithographic patterning technique. Unlike other unconventional methods, the substrate surface can be made exposed and the resulting pattern height is sufficiently high for subsequent etching of the substrate. (C) 2004 American Institute of Physics.