The use of proton microbeams for the production of microcomponents

被引:29
作者
Osipowicz, T [1 ]
van Kan, JA [1 ]
Sum, TC [1 ]
Sanchez, JL [1 ]
Watt, F [1 ]
机构
[1] Natl Univ Singapore, Dept Phys, Res Ctr Nucl Microscopy, Singapore 119262, Singapore
关键词
micromachining; nuclear microscope; high aspect-ratio;
D O I
10.1016/S0168-583X(99)00670-9
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The recently developed process of high-energy ion beam micromachining (proton micromachining) is discussed. Proton micromachining is a novel process for the production of high aspect-ratio 3D microstructures. The sub-micron lateral resolution and the well-defined range of an MeV proton microbeam are utilized to make lithographic structures in suitable polymers (e.g., SU-8, PMMA). Sub-micron structures with a depth of tens of microns and aspect-ratios approaching 100 have been achieved. The use of different energies for multiple exposures allows the production of intricate 3D multi-layer structures in a single polymer layer, and because no mask is needed the process offers a wide range of possible geometries for the production of non-prismatic or even rounded features. The throughput of the technique does not compare favourably with conventional (masked) processes for high volume batch production of microcomponents. On the other hand, significant applications of high-energy ion beam micromachining may be developed, e.g. for the rapid production of prototypes, the research into the characteristics of microstructures, and the manufacture of molds, stamps and X-ray masks. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:83 / 89
页数:7
相关论文
共 15 条
[1]  
Becker E. W., 1986, Microelectronic Engineering, V4, P35, DOI 10.1016/0167-9317(86)90004-3
[2]   MEV ION-BEAM LITHOGRAPHY OF PMMA [J].
BREESE, MBH ;
GRIME, GW ;
WATT, F ;
WILLIAMS, D .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1993, 77 (1-4) :169-174
[3]   Maskless fabrication of 3-dimensional microstructures in PMMA using a nuclear microprobe [J].
de Kerckhove, DG ;
Breese, MBH ;
Marsh, MA ;
Grime, GW .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1998, 136 :379-384
[4]   DEEP X-RAY-LITHOGRAPHY FOR THE PRODUCTION OF 3-DIMENSIONAL MICROSTRUCTURES FROM METALS, POLYMERS AND CERAMICS [J].
EHRFELD, W ;
LEHR, H .
RADIATION PHYSICS AND CHEMISTRY, 1995, 45 (03) :349-365
[5]  
Mason LM, 1996, ION BEAM MODIFICATION OF MATERIALS, P1110
[6]   The novel ultrastable HVEE 3.5 MV Singletron(TM) accelerator for nanoprobe applications [J].
Mous, DJW ;
Haitsma, RG ;
Butz, T ;
Flagmeyer, RH ;
Lehmann, D ;
Vogt, J .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1997, 130 (1-4) :31-36
[7]   A high resolution beam scanning system for deep ion beam lithography [J].
Sanchez, JL ;
van Kan, JA ;
Osipowicz, T ;
Springham, SV ;
Watt, F .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1998, 136 :385-389
[8]   Proton micromachining of substrate scaffolds for cellular and tissue engineering [J].
Sanchez, JL ;
Guy, G ;
van Kan, JA ;
Osipowicz, T ;
Watt, F .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1999, 158 (1-4) :185-189
[9]   Micromachining using deep ion beam lithography [J].
Springham, SV ;
Osipowicz, T ;
Sanchez, JL ;
Gan, LH ;
Watt, F .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1997, 130 (1-4) :155-159
[10]   Resist materials for proton micromachining [J].
van Kan, JA ;
Sanchez, JL ;
Xu, B ;
Osipowicz, T ;
Watt, F .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1999, 158 (1-4) :179-184