RF characteristics of a high-performance, 10-fF/μm2 capacitor in a deep trench

被引:10
作者
Cai, WZ [1 ]
Shastri, S [1 ]
Grivna, G [1 ]
Wu, YJ [1 ]
Loechelt, G [1 ]
机构
[1] ON Semicond Corp, Technol Dev Grp, Phoenix, AZ 85008 USA
关键词
monolithic microwave integrated circuits (MMICs); on-wafer S-parameter measurement; radio-frequency (RF) device; three-dimensional passive circuits; trench capacitor;
D O I
10.1109/LED.2004.831195
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report the properties of a novel polysilicon-insulator-polysilicon trench capacitor with a 380-Angstrom Si3N4 dielectric that is designed and fabricated for high-frequency bypass and decoupling applications. The capacitor has a specific capacitance as high as 10 fF/mum(2) normalized to its footprint area, and a breakdown voltage greater than 15 V at room temperature. The measured S-parameters are in excellent agreement with simulations of an equivalent circuit model that includes a shunt substrate resistance to ground (R-sub). A geometric factor mu is defined as the ratio of the imaginary parts of Y-11 and -Y-21 at low frequency. The values of mu and, consequently, R-sub are extracted from fitting the measured S-parameter data, and the layout dependence of mu and R-sub is also explained by the model.
引用
收藏
页码:468 / 470
页数:3
相关论文
共 10 条
[1]   Integrated RF components in a SiGe bipolar technology [J].
Burghartz, JN ;
Soyuer, M ;
Jenkins, KA ;
Kies, M ;
Dolan, M ;
Stein, KJ ;
Malinowski, J ;
Harame, DL .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1997, 32 (09) :1440-1445
[2]  
GRIVNA G, 2002, Patent No. 6498069
[3]   Three-dimensional passive circuit technology for ultra-compact MMIC's [J].
Hirano, M ;
Nishikawa, K ;
Toyoda, I ;
Aoyama, S ;
Sugitani, S ;
Yamasaki, K .
IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES, 1995, 43 (12) :2845-2850
[4]  
KISHI K, 1989, P INT C MICR TEST ST, P245
[5]  
LEE KS, 1999, PHOTONICS SCI NEWS, V4, P9
[6]   A novel capacitor technology based on porous silicon [J].
Lehmann, V ;
Honlein, W ;
Reisinger, H ;
Spitzer, A ;
Wendt, H ;
Willer, J .
THIN SOLID FILMS, 1996, 276 (1-2) :138-142
[7]   Active LC filters on silicon [J].
Li, D ;
Tsividis, Y .
IEE PROCEEDINGS-CIRCUITS DEVICES AND SYSTEMS, 2000, 147 (01) :49-56
[8]   A Si 1.8 GHz RLC filter with tunable center frequency and quality factor [J].
Pipilos, S ;
Tsividis, YP ;
Fenk, J ;
Papananos, Y .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1996, 31 (10) :1517-1525
[9]   High-value MOS capacitor arrays in ultradeep trenches in silicon [J].
Roozeboom, F ;
Elfrink, R ;
Verhoeven, J ;
van den Meerakker, J ;
Holthuysen, F .
MICROELECTRONIC ENGINEERING, 2000, 53 (1-4) :581-584
[10]   Si and SiGe millimeter-wave integrated circuits [J].
Russer, P .
IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES, 1998, 46 (05) :590-603