Thermal evolution of carbon in annealed Co/C soft x-ray multilayers

被引:11
作者
Bai, HL
Jiang, EY
Wang, CD
Sun, DC
机构
[1] Department of Applied Physics, Tianjin University
关键词
D O I
10.1063/1.363010
中图分类号
O59 [应用物理学];
学科分类号
摘要
The structures of the carbon sublayers in the annealed Co/C soft x-ray multilayers fabricated using a dual-facing-target sputtering system have been characterized by x-ray diffraction (XRD), transmission electron microscopy (TEM), and Raman spectroscopy (RS). The results suggest that the structural variations in the carbon layers can be roughly divided into three stages, i.e. ordering, crystalline and grain growth stages. In the ordering stage with annealing temperatures below 400 degrees C, the upward shift of D and G Lines in Raman spectra indicates that the amorphous carbon layers are changing from ones with bond-angle disorder and fourfold-bonding only to ones containing threefold-bonding. In the crystalline stage, the amorphous carbon layers in the as-deposited multilayers crystallize to graphite crystallites in the annealing temperature range of 500-600 degrees C. The rapid increase in the intensity ratio of D line to G line and dramatic decrease in linewidth further confirm this substantial structural change. In the grain growth stage, the specimens are annealed at temperatures higher than 700 degrees C. The decrease in the intensity ratio implies a growth in the graphite crystallite dimensions, which is consistent with the XRD and TEM results. (C) 1996 American Institute of Physics.
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页码:1428 / 1436
页数:9
相关论文
共 44 条
[11]   X-RAY INTERACTIONS - PHOTOABSORPTION, SCATTERING, TRANSMISSION, AND REFLECTION AT E=50-30,000 EV, Z=1-92 [J].
HENKE, BL ;
GULLIKSON, EM ;
DAVIS, JC .
ATOMIC DATA AND NUCLEAR DATA TABLES, 1993, 54 (02) :181-342
[12]   INTERFACIAL REACTIONS ON ANNEALING MOLYBDENUM-SILICON MULTILAYERS [J].
HOLLOWAY, K ;
DO, KB ;
SINCLAIR, R .
JOURNAL OF APPLIED PHYSICS, 1989, 65 (02) :474-480
[13]  
IBERS JA, 1974, INT TABLES XRAY CRYS, P149
[14]   EXPANSION OF AMORPHOUS-CARBON IN W/C MULTILAYERS AFTER ANNEALING [J].
JIANG, XM ;
XIAN, DC ;
WU, ZQ .
APPLIED PHYSICS LETTERS, 1990, 57 (24) :2549-2551
[15]   IMPROVEMENT OF THE THERMAL-STABILITY OF W/C MULTILAYERS [J].
JIANG, Z ;
DUPUIS, V ;
VIDAL, B ;
RAVET, MF ;
PIECUCH, M .
JOURNAL OF APPLIED PHYSICS, 1992, 72 (03) :931-937
[16]   RAMAN-SCATTERING FROM CARBON IN TUNGSTEN CARBON MULTILAYER FILMS [J].
JIANG, Z ;
VIDAL, B ;
DESROUSSEAUX, G ;
DUPUIS, V ;
PIECUCH, M ;
RAVET, MF .
JOURNAL OF APPLIED PHYSICS, 1993, 74 (01) :249-254
[17]   ELECTRON DIFFRACTION STUDY OF EVAPORATED CARBON FILMS [J].
KAKINOKI, J ;
KATADA, K ;
HANAWA, T ;
INO, T .
ACTA CRYSTALLOGRAPHICA, 1960, 13 (03) :171-179
[18]  
KORTRIGHT JB, 1988, MATER RES SOC S P, V103, P95
[19]   TUNGSTEN-CARBON MULTILAYER COMPOSITION AND THE EFFECTS OF ANNEALING - A GLANCING ANGLE EXTENDED X-RAY ABSORPTION FINE-STRUCTURE STUDY [J].
LAMBLE, GM ;
HEALD, SM ;
SAYERS, DE ;
ZIEGLER, E ;
VICCARO, PJ .
JOURNAL OF APPLIED PHYSICS, 1989, 65 (11) :4250-4255
[20]  
LEPETRE Y, 1986, J APPL PHYS, V64, P2301