EXPANSION OF AMORPHOUS-CARBON IN W/C MULTILAYERS AFTER ANNEALING

被引：27

作者：

JIANG, XM ^{[1
]}

XIAN, DC ^{[1
]}

WU, ZQ ^{[1
]}

机构：

[1] UNIV SCI & TECHNOL CHINA,CTR FUNDAMENTAL PHYS,HEFEI 230026,PEOPLES R CHINA

来源：

APPLIED PHYSICS LETTERS | 1990年 / 57卷 / 24期

关键词：

D O I：

10.1063/1.103833

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Dynamical optical dispersion theory is employed to analyze the variations of the positions and intensities of x-ray diffraction peaks from the W/C multilayer. It is confirmed that the thickness of the C layer expands with the annealing temperature and the multilayer remains undamaged until 800°C. There is an obvious drop of interfacial root mean square (rms) roughness at 600-800°C.

引用

页码：2549 / 2551

页数：3

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