Photosensitive poly(benzoxazole) via poly(o-hydroxy azomethine) II.: Environmentally benign process in ethyl lactate

被引:21
作者
Fukukawa, K [1 ]
Shibasaki, Y [1 ]
Ueda, M [1 ]
机构
[1] Tokyo Inst Technol, Grad Sch Sci & Engn, Dept Organ & Polymer Mat, Meguro Ku, Tokyo 1528552, Japan
关键词
poly(benzoxazole)s; poly(o-hydroxyazomethine); environmentally friendly process; high temperature material; photosensitive material; photoresist; low dielectric constants;
D O I
10.1295/polymj.36.489
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
The synthesis and photosensitivity of poly(o-hydroxyazomethine) (PHAM) from isophthalaldehyde (IPA) and 4,4'-(hexafluoroisopropylidene)bis(o-aminophenol) (6FAP) in an environmentally friendly solvent, ethyl lactate (EL) was investigated. Polycondensation of IPA and 6FAP proceeded in EL, giving PHAM with a number average molecular weight more than ten thousands. The solution of PHAM in EL showed a good stability for hydrolysis. The photosensitive film cast from the solution of PHAM and 25 wt % 1-{1,1-bis[4-(2-diazo-1-(2H)-naphthalenone-5-sulfonyloxy)phenyl]methylethyl}benzene (S-DNQ) in EL showed a sensitivity (DO) of 250 mJ/cm(2) and a contrast (gamma(0)) of 2.5 with 436 nm light (g-line), respectively. A fine positive image featuring 10 pm line-and-space pattern was observed on the film of the photoresist exposed to 200 mJ/cm(2) of g-line by the contact-printing mode. The positive image was successfully converted to a poly(benzoxazole) (PBO) pattern by thermal treatment. The optically estimated dielectric constant of the PBO is 2.76.
引用
收藏
页码:489 / 494
页数:6
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