Nanoimprint using three-dimensional microlens mold made by focused-ion-beam chemical vapor deposition

被引:45
作者
Watanabe, K
Morita, T
Kometani, R
Hoshino, T
Kondo, K
Kanda, K
Haruyama, Y
Kaito, T
Fujita, J
Ishida, M
Ochiai, Y
Tajima, T
Matsui, S
机构
[1] Himeji Inst Technol, Grad Sch Sci, LASTI, Ako, Hyogo 6781205, Japan
[2] Japan Sci & Technol Co, CREST, JST, Chiyoda Ku, Tokyo 1028666, Japan
[3] Seiko Instruments Inc, Shizuoka 4101393, Japan
[4] NEC Fundamental Res Labs, Tsukuba, Ibaraki 3058051, Japan
[5] Crestec Co, Hachioji, Tokyo 1920045, Japan
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2004年 / 22卷 / 01期
关键词
D O I
10.1116/1.1633281
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Three-dimensional diamond-like carbon mold fabricated by focused-ion-beam chemical vapor deposition (FIB-CVD) using a precursor of phenanthrene has been applied to a nanoimprint lithography (NIL) process. The mold has a very smooth surface, which is one of the advantages for the fabrication of optical devices. FIB-CVD uses a Ga+ beam control system which convert three-dimensional computer aided design data into the scanning signal and is capable of fabricating any shape of optical device mold surface such as a microlens. The microlens molds have been replicated onto poly (methylmethacrylate) (PMMA) and hydrogen silsequioxane using NIL. A microlens of polydimenthyl siloxane has been fabricated by replication using the PMMA reversal mold fabricated by NIL using the FIB-CVD mold. (C) 2004 American Vacuum Society.
引用
收藏
页码:22 / 26
页数:5
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