Epitaxially grown LaNiO3 thin films on SrTiO3(100) substrates by the chemical solution method

被引：8

作者：

Hwang, K

Lim, Y

Kim, B

机构：

[1] Chonnam Natl Univ, Dept Ceram Engn, Kwangju 500757, South Korea

[2] Kwangju Hlth Coll, Dept Ophthalm Opt, Kwangju 506306, South Korea

来源：

MATERIALS RESEARCH BULLETIN | 1999年 / 34卷 / 12-13期

关键词：

thin films; epitaxial growth; X-ray diffraction;

D O I：

10.1016/S0025-5408(99)00202-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

LaNiO3 (LNO) thin films were spin-coated onto the SrTiO3(100) (STO) substrates by the chemical solution method. X-ray diffraction (XRD) theta-20 scans and X-ray beta scans were used to determine the crystallinity and in-plane alignment behavior of the films. XRD patterns showed that the LNO thin films obtained by annealing at 600-750 degrees C were highly oriented, while the film annealed at 800 degrees C had random orientation. The resistivity vs, temperature curve of the epitaxially grown film annealed at 750 degrees C, confirmed by beta scanning, showed that the film possessed good metallic character. The fracture cross-section of the epitaxial LNO film on STO was uniform and dense along the cross section direction, (C) 2000 Elsevier Science Ltd.

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页码：2069 / 2074

页数：6

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