Sheath resistance measurements in the GEC reference reactor

被引:17
作者
Kleber, JL [1 ]
Overzet, LJ [1 ]
机构
[1] Univ Texas, Plasma Applicat Lab, Richardson, TX 75083 USA
关键词
D O I
10.1088/0963-0252/8/4/303
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
A Langmuir probe biased above or below a floating potential draws net electron or ion current. As a result, a different electron current must how through the grounded electrode sheath to maintain the plasma's time-averaged quasi-neutrality The direct current components of the sheath, plasma and floating potentials must change from their values at zero probe current in order to change the electron current to the, grounded electrode. The rate at which the Boating potential changes with probe (and sheath) current is called the sheath resistance. Analysis of probe data could give incorrect values far the plasma potential, the electron temperature and the electron density (n(e)), and give a distorted electron energy probability function if sheath resistance is ignored. The sheath resistance was measured using a Langmuir probe and a microwave interferometer in inductively coupled plasmas in argon, nitrogen and an argon(95%)/chlorine(5%) mixture in the Gaseous Electronics Conference reactor. The sheath resistance was found to be small for these measurements, consequently if it had been ignored, the electron density would have been underestimated by up to 42% and the electron temperature overestimated by up to 31%. The sheath resistance was found to have an n(e)(-1) dependence in argon as expected, but an n(e)(-1.4) dependence in nitrogen and an n(e)(-0.6) dependence in the argon/chlorine mixture.
引用
收藏
页码:534 / 543
页数:10
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