Patterning of thin-film microstructures on non-planar substrate surfaces using decal transfer lithography

被引：54

作者：

Childs, WR

Nuzzo, RG ^{[1
]}

机构：

[1] Univ Illinois, Sch Chem Sci, Dept Mat Sci & Engn, Urbana, IL 61801 USA

[2] Univ Illinois, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA

来源：

ADVANCED MATERIALS | 2004年 / 16卷 / 15期

关键词：

D O I：

10.1002/adma.200400592

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Soft-lithographic patterning of thin-film material microstructures supported on spherically curved lenses (see Figure) using an extension of decal transfer lithography (DTL) is reported. These processes have been used to successfully create a pattern of amorphous silicon and gold thin-film microstructures with feature sizes ranging from 2 mum to 75 mum. This has been achieved without noticeable defects using wet and reactive-ion etching processes across large substrate areas.

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页码：1323 / +

页数：6

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