Formation of local p+ region in ZnSe by Cu3Ge contact

被引:2
作者
Chang, SJ
Chen, WR
Su, YK
Chen, JF
Lan, WH
Lin, ACH
Chang, H
机构
[1] Natl Cheng Kung Univ, Dept Elect Engn, Tainan 70101, Taiwan
[2] Chung Shan Inst Sci & Technol, Lungtan 325, Taiwan
关键词
D O I
10.1049/el:19991480
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Cu3Ge/Pt/Au has been deposited onto the surface of p-ZnSe, n(+)-ZnSe and n-ZnSe. It was found that the observed Cu3Ge/pZnSe ohmic behaviour is due mainly to hole tunnelling through the metal/semiconductor interface. A p(+)-n junction-like I-V characteristic for Cu3Ge/n-ZnSe was also observed. Furthermore, a negative differential resistance with a peak-to-valley ratio of similar to 6 was observed under forward bias when Cu3Ge was deposited onto,n(+)-ZnSe. These observations all suggest that Cu3Ge can form a local p(+) region on the ZnSe surface.
引用
收藏
页码:2231 / 2232
页数:2
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