Preparation of Al-doped ZnO thin films by RF thermal plasma evaporation

被引：20

作者：

Tsujino, J

Homma, N

Sugawara, T

Shimono, I

Abe, Y

机构：

[1] Hokkaido Elect Power Co Inc, Ebetsu, Hokkaido 0670033, Japan

[2] Hokkaido Ind Technol Ctr, Hakodate, Hokkaido 0410801, Japan

[3] Hokkaido Ind Res Inst, Kita Ku, Sapporo, Hokkaido 0600819, Japan

来源：

THIN SOLID FILMS | 2002年 / 407卷 / 1-2期

关键词：

transparent conductive oxide film; Al-doped ZnO; thermal plasma evaporation;

D O I：

10.1016/S0040-6090(02)00017-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In this study, Al-doped ZnO films were prepared by RF thermal plasma evaporation, and the influence of the O-2 flow rate and Zn concentration in the raw solution on film growth was investigated. The surface roughness of the films was improved under a lower O-2 flow rate. The electrical resisitivity also decreased with decreasing O-2 flow rate, and the minimum resistivity of 9 x 10(-4) Omega cm was obtained at an O-2 flow rate of 30 ml/min, which corresponds to a ratio of 0.069% of total gas flow rate. The deposition rate increased proportionally with increasing Zn concentration in the raw solution. The film prepared at the maximum Zn concentration of 100 g/l exhibited a deposition rate of 110 nm/min and the electrical resistivity of 2.2 x 10(-3) Omega cm. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

收藏

页码：86 / 91

页数：6

相关论文

共 16 条

[1] TRANSPARENT CONDUCTORS - A STATUS REVIEW [J].

CHOPRA, KL ;

MAJOR, S ;

PANDYA, DK .

THIN SOLID FILMS, 1983, 102 (01) :1-46

[2] Optimization of Al-doped ZnO window layers for large-area Cu(InGa)Se2-based modules by RF/DC/DC multiple magnetron sputtering [J].

Cooray, NF ;

Kushiya, K ;

Fujimaki, A ;

Okumura, D ;

Sato, M ;

Ooshita, M ;

Yamase, O .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1999, 38 (11) :6213-6218

[3]

KIKUCHI K, 1993, J MATER SCI LETT, V12, P1392, DOI 10.1007/BF00241719

[4] HIGHLY CONDUCTIVE AND TRANSPARENT ZNO THIN-FILMS PREPARED BY RF MAGNETRON SPUTTERING IN AN APPLIED EXTERNAL DC MAGNETIC-FIELD [J].

MINAMI, T ;

NANTO, H ;

TAKATA, S .

THIN SOLID FILMS, 1985, 124 (01) :43-47

[5] CONDUCTION MECHANISM OF HIGHLY CONDUCTIVE AND TRANSPARENT ZINC-OXIDE THIN-FILMS PREPARED BY MAGNETRON SPUTTERING [J].

MINAMI, T ;

SATO, H ;

OHASHI, K ;

TOMOFUJI, T ;

TAKATA, S .

JOURNAL OF CRYSTAL GROWTH, 1992, 117 (1-4) :370-374

[6] Growth of p-type zinc oxide films by chemical vapor deposition [J].

Minegishi, K ;

Koiwai, Y ;

Kikuchi, Y ;

Yano, K ;

Kasuga, M ;

Shimizu, A .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1997, 36 (11A) :L1453-L1455

[7] ZNO THIN-FILMS PREPARED BY ION-ASSISTED DEPOSITION METHOD [J].

MIYAMOTO, K ;

YOSHIDA, M ;

TOYOTAMA, H ;

ONARI, S ;

ARAI, T .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (08) :1830-1835

[8] Extremely transparent and conductive ZnO:Al thin films prepared by photo-assisted metalorganic chemical vapor deposition (photo-MOCVD) using AlCl3(6H(2)O) as new doping material [J].

Myong, SY ;

Baik, SJ ;

Lee, CH ;

Cho, WY ;

Lim, KS .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1997, 36 (8B) :L1078-L1081

[9] Effects of pressure on PbTiO3 thin film prepared by low-pressure thermal plasma deposition [J].

Nagata, S ;

Wakiya, N ;

Shinozaki, K ;

Masuda, Y ;

Mizutani, N .

JOURNAL OF THE JAPAN INSTITUTE OF METALS, 1999, 63 (01) :62-67

[10] EFFECT OF WATER-VAPOR ON THE GROWTH OF TEXTURED ZNO-BASED FILMS FOR SOLAR-CELLS BY DC-MAGNETRON SPUTTERING [J].

NAKADA, T ;

OHKUBO, Y ;

KUNIOKA, A .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (12A) :3344-3348