Fabrication of microstructures in photoetchable glass ceramics using excimer and femtosecond lasers

被引:28
作者
Kim, J [1 ]
Berberoglu, H [1 ]
Xu, XF [1 ]
机构
[1] Purdue Univ, Sch Mech Engn, W Lafayette, IN 47907 USA
来源
JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS | 2004年 / 3卷 / 03期
关键词
photoetchable glass ceramics; excimer laser; femtosecond laser; micromachining; 3-D machining;
D O I
10.1117/1.1759330
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We discuss laser fabrication of microstructures in photoetchable glass ceramics called Foturan (Schott Company, Elmsford, NY). A KrF excimer laser (lambda = 248 nm, tau = 25 ns) is used for surface micromachining, and a femtosecond laser (lambda = 800 nm, tau = 80 fs) is used for fabricating 3-D structures. Important aspects of the machining, such as depth of machining resulting from different laser processing parameters and threshold laser fluences, are presented. A detailed analysis of the absorption process of both lasers in photoetchable glass ceramics is provided. (C) 2004 Society of Photo-Optical Instrumentation Engineers.
引用
收藏
页码:478 / 485
页数:8
相关论文
共 16 条
[1]   GEM-type detectors using LIGA and etchable glass technologies [J].
Ahn, SK ;
Kim, JG ;
Perez-Mendez, V ;
Chang, S ;
Jackson, KH ;
Kadyk, JA ;
Wenzel, WA ;
Cho, G .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2002, 49 (03) :870-874
[2]   Optical gratings embedded in photosensitive glass by photochemical reaction using a femtosecond laser [J].
Cheng, Y ;
Sugioka, K ;
Masuda, M ;
Shihoyama, K ;
Toyoda, K ;
Midorikawa, K .
OPTICS EXPRESS, 2003, 11 (15) :1809-1816
[3]   Control of the cross-sectional shape of a hollow microchannel embedded in photostructurable glass by use of a femtosecond laser [J].
Cheng, Y ;
Sugioka, K ;
Midorikawa, K ;
Masuda, M ;
Toyoda, K ;
Kawachi, M ;
Shihoyama, K .
OPTICS LETTERS, 2003, 28 (01) :55-57
[4]   Micro-etching technology of high aspect ratio frameworks for electronic devices [J].
Cho, YR ;
Oh, JY ;
Kim, HS ;
Jeong, HS .
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1999, 64 (02) :79-83
[5]   Fabrication technologies for microsystems utilizing photoetchable glass [J].
Dietrich, TR ;
Ehrfeld, W ;
Lacher, M ;
Kramer, M ;
Speit, B .
MICROELECTRONIC ENGINEERING, 1996, 30 (1-4) :497-504
[6]   Fabrication of true 3D microstructures in glass/ceramic materials by pulsed UV laser volumetric exposure techniques [J].
Fuqua, P ;
Janson, SW ;
Hansen, WW ;
Helvajian, H .
LASER APPLICATIONS IN MICROELECTRONIC AND OPTOELECTRONIC MANUFACTURING IV, 1999, 3618 :213-220
[7]   A UV direct-write approach for formation of embedded structures in photostructurable glass-ceramics [J].
Fuqua, PD ;
Taylor, DP ;
Helvajian, H ;
Hansen, WW ;
Abraham, MH .
MATERIALS DEVELOPMENT FOR DIRECT WRITE TECHNOLOGIES, 2000, 624 :79-86
[8]  
HANSEN WW, 2002, IND PHYSICIST JUN, P18
[9]   Development of a 100 gm class inspector satellite using photostructurable glass/ceramic materials [J].
Huang, A ;
Hansen, WW ;
Janson, SW ;
Helvajian, H .
PHOTON PROCESSING IN MICROELECTRONICS AND PHOTONICS, 2002, 4637 :297-304
[10]   Three-dimensional microdrilling of glass by multiphoton process and chemical etching [J].
Kondo, Y ;
Qiu, J ;
Mitsuyu, T ;
Hirao, K ;
Yoko, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1999, 38 (10A) :L1146-L1148