Strain and composition of capped Ge/Si self-assembled quantum dots grown by chemical vapor deposition

被引:36
作者
Patriarche, G
Sagnes, I
Boucaud, P
Le Thanh, V
Bouchier, D
Hernandez, C
Campidelli, Y
Bensahel, D
机构
[1] Lab Concepts & Disposit Photon, CNRS, URA 250, F-92225 Bagneux, France
[2] Univ Paris 11, Inst Elect Fondamentale, CNRS, UMR 8622, F-91405 Orsay, France
[3] France Telecom, F-38243 Meylan, France
关键词
D O I
10.1063/1.126979
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have investigated the composition and the strain profile of Ge/Si self-assembled quantum dots. The quantum dots, grown by low-or high-pressure chemical vapor deposition, were covered by a silicon cap layer. The composition and the strain were measured by the selected area transmission electron diffraction of a single quantum dot. The self-assembled quantum dots exhibit a quadratic deformation. No lateral relaxation of the lattice is observed from the main part of the quantum dot. An average composition of Ge around 50% is deduced. The average composition is found dependent on the size of the islands. This composition is correlated to the photoluminescence energy. (C) 2000 American Institute of Physics. [S0003-6951(00)01129-3].
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页码:370 / 372
页数:3
相关论文
共 16 条
  • [1] Strain-driven alloying in Ge/Si(100) coherent islands
    Chaparro, SA
    Drucker, J
    Zhang, Y
    Chandrasekhar, D
    McCartney, MR
    Smith, DJ
    [J]. PHYSICAL REVIEW LETTERS, 1999, 83 (06) : 1199 - 1202
  • [2] DISLOCATION-FREE STRANSKI-KRASTANOW GROWTH OF GE ON SI(100)
    EAGLESHAM, DJ
    CERULLO, M
    [J]. PHYSICAL REVIEW LETTERS, 1990, 64 (16) : 1943 - 1946
  • [3] GROWTH BY MOLECULAR-BEAM EPITAXY AND CHARACTERIZATION OF INAS/GAAS STRAINED-LAYER SUPERLATTICES
    GOLDSTEIN, L
    GLAS, F
    MARZIN, JY
    CHARASSE, MN
    LEROUX, G
    [J]. APPLIED PHYSICS LETTERS, 1985, 47 (10) : 1099 - 1101
  • [4] Size distribution of Ge islands grown on Si(001)
    Goryll, M
    Vescan, L
    Schmidt, K
    Mesters, S
    Luth, H
    Szot, K
    [J]. APPLIED PHYSICS LETTERS, 1997, 71 (03) : 410 - 412
  • [5] Ge Si self-assembled quantum dots grown on Si(001) in an industrial high-pressure chemical vapor deposition reactor
    Hernandez, C
    Campidelli, Y
    Simon, D
    Bensahel, D
    Sagnes, I
    Patriarche, G
    Boucaud, P
    Sauvage, S
    [J]. JOURNAL OF APPLIED PHYSICS, 1999, 86 (02) : 1145 - 1148
  • [6] Dome-to-pyramid transition induced by alloying of Ge islands on Si(001)
    Kamins, TI
    Medeiros-Ribeiro, G
    Ohlberg, DAA
    Williams, RS
    [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1998, 67 (06): : 727 - 730
  • [7] Deposition of three-dimensional Ge islands on Si(001) by chemical vapor deposition at atmospheric and reduced pressures
    Kamins, TI
    Carr, EC
    Williams, RS
    Rosner, SJ
    [J]. JOURNAL OF APPLIED PHYSICS, 1997, 81 (01) : 211 - 219
  • [8] Test of Vegard's law in thin epitaxial SiGe layers
    Kasper, E
    Schuh, A
    Bauer, G
    Hollander, B
    Kibbel, H
    [J]. JOURNAL OF CRYSTAL GROWTH, 1995, 157 (1-4) : 68 - 72
  • [9] Vertically self-organized Ge/Si(001) quantum dots in multilayer structures
    Le Thanh, V
    Yam, V
    Boucaud, P
    Fortuna, F
    Ulysse, C
    Bouchier, D
    Vervoort, L
    Lourtioz, JM
    [J]. PHYSICAL REVIEW B, 1999, 60 (08) : 5851 - 5857
  • [10] Nucleation and growth of self-assembled Ge/Si(001) quantum dots
    Le Thanh, V
    Boucaud, P
    Debarre, D
    Zheng, Y
    Bouchier, D
    Lourtioz, JM
    [J]. PHYSICAL REVIEW B, 1998, 58 (19): : 13115 - 13120