Plasma chemistry during deposition of a-C:H

被引：38

作者：

Benedikt, J ^{[1
]}

Letourneur, KGY ^{[1
]}

Wisse, M ^{[1
]}

Schram, DC ^{[1
]}

de Sanden, MCM ^{[1
]}

机构：

[1] Eindhoven Univ Technol, Dept Appl Phys, NL-5600 MB Eindhoven, Netherlands

来源：

关键词：

diamond-like carbon; hydrogenated amorphous carbon; acetylene; spectroscopy;

D O I：

10.1016/S0925-9635(01)00534-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The different dissociation products (C, C-2 CH and C2H) from C2H2 dissociation in a remote Ar/C2H2 plasma were measured using Cavity Ring Down Spectroscopy (CRDS). Whereas the radicals C, C-2 and CH were spectrally identified, in the region where C2H absorption is usually assigned (260-290 nm) only broadband absorption was observed. Suggestions are given on how to explain the broadband absorption, but as yet no clear identification has been made and no species assigned to it. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：989 / 993

页数：5

共 20 条

[1]

BENEDIKT J, IN PRESS

[2]

BUSCH KW, 1999, CAVITY RINGDOWN SPEC

[3] Argon ion-induced dissociation of acetylene in an expanding Ar/C2H2 plasma [J].

de Graaf, A ;

van Hest, MFAM ;

van de Sanden, MCM ;

Letourneur, KGY ;

Schram, DC .

APPLIED PHYSICS LETTERS, 1999, 74 (20) :2927-2929

[4]

DEGRAAF A, 1999, P 14 INT S PLASM CHE, V1, P1755

[5] Branching ratios in dissociative recombination of the C2H2+ molecular ion [J].

Derkatch, AM ;

Al-Khalili, A ;

Vikor, L ;

Neau, A ;

Shi, W ;

Danared, H ;

af Ugglas, M ;

Larsson, M .

JOURNAL OF PHYSICS B-ATOMIC MOLECULAR AND OPTICAL PHYSICS, 1999, 32 (14) :3391-3398

[6] Detection of CH in an expanding argon/acetylene plasma using cavity ring down absorption spectroscopy [J].

Engeln, R ;

Letourneur, KGY ;

Boogaarts, MGH ;

van de Sanden, MCM ;

Schram, DC .

CHEMICAL PHYSICS LETTERS, 1999, 310 (5-6) :405-410

[7] CAN PHASE-SPACE THEORY REPRODUCE EXPERIMENTAL NEUTRAL PRODUCT BRANCHING RATIOS FOR DISSOCIATIVE RECOMBINATION REACTIONS [J].

GALLOWAY, ET ;

HERBST, E .

ASTROPHYSICAL JOURNAL, 1991, 376 (02) :531-539

[8] Quality improvement of plasma-beam-deposited amorphous hydrogenated carbon with higher growth rate [J].

Gielen, JWAM ;

vandeSanden, MCM ;

Kleuskens, PRM ;

Schram, DC .

PLASMA SOURCES SCIENCE & TECHNOLOGY, 1996, 5 (03) :492-498

[9] Plasma beam deposited amorphous hydrogenated carbon: Improved film quality at higher growth rate [J].

Gielen, JWAM ;

vandeSanden, MCM ;

Schram, DC .

APPLIED PHYSICS LETTERS, 1996, 69 (02) :152-154

[10] Effect of substrate conditions on the plasma beam deposition of amorphous hydrogenated carbon [J].

Gielen, JWAM ;

Kessels, WMM ;

vandeSanden, MCM ;

Schram, DC .

JOURNAL OF APPLIED PHYSICS, 1997, 82 (05) :2643-2654

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