Apparatus for temperature programmed desorption studies of thin films

被引：6

作者：

Chalamala, BR ^{[1
]}

Uebelhoer, D ^{[1
]}

Reuss, RH ^{[1
]}

机构：

[1] Motorola Inc, Flat Panel Display Div, Tempe, AZ 85284 USA

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 2000年 / 71卷 / 01期

关键词：

D O I：

10.1063/1.1150201

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

A versatile analytical system based on thermal desorption spectroscopy of thin films is presented. We have found the apparatus to be a useful tool for measuring the desorption characteristics of trapped gases in physical vapor deposited thin films and in determining the thermal stability of multi-component thin film compounds and multilayer structures. The system was also found to be a convenient tool for determining outgassing properties of thin film and thick film materials for vacuum microelectronic device applications. (C) 2000 American Institute of Physics. [S0034-6748(00)02801-X].

引用

页码：320 / 321

页数：2

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