The influence of the ion flux density on the properties of molybdenum films deposited from the vapour phase under simultaneous argon ion irradiation

被引：10

作者：

Ensinger, W

机构：

[1] Universität Augsburg, Institut für Physik, 86159 Augsburg

来源：

THIN SOLID FILMS | 1996年 / 275卷 / 1-2期

关键词：

molybdenum; ion bombardment; argon; deposition process;

D O I：

10.1016/0040-6090(95)07018-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Molybdenum was deposited from the vapour phase onto fused quartz and alumina at room temperature under simultaneous irradiation with energetic argon ions with different ion flux densities. It was observed that increasing ion irradiation intensity lead to a sight increase in grain size, to a reduction in oxygen incorporation from the residual gas, and to argon ion implantation. As a result, a strong reduction in resistivity was observed. On iron substrates, electrochemical polarization measurements showed a reduction in microporosity.

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页码：54 / 57

页数：4

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