CONTROL OF MICROSTRUCTURE AND PROPERTIES OF COPPER-FILMS USING ION-ASSISTED DEPOSITION

被引:92
作者
ROY, RA
CUOMO, JJ
YEE, DS
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期
关键词
D O I
10.1116/1.575339
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
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页码:1621 / 1626
页数:6
相关论文
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