Wafer-scale Ni imprint stamps for porous alumina membranes based on interference lithography

The fabrication of wafer scale, nanoporous anodic aluminum oxide using large area Ni imprint stamps with arrays of imprint tips in a hexagonal or square lattice was analyzed. Nanoporous anodic aluminum oxide(AAO) is used as a template material for the preparation of multifunctional nanostructure which can be applied in various scientific and technological field. An approach was used for development of large scale metallic stamps to imprint AI and it consisted two steps. The replication of Ni imprint stamps from a master pattern and the subsequent fabrication of long range ordered AAO by anodization of AI prepatterned using the Ni stamps. The Ni imprint stamps could be successfully used up to ten times for the surface prepatterning of AI with a high fidelity in pattern transfer. The result shows that nanoporous alumina membranes could be used as templates for developing advanced functional nanostructures over large areas such as a whole wafer.