Growth of InSb on GaAs using InAlSb buffer layers

被引:16
作者
Biefeld, RM [1 ]
Phillips, JD [1 ]
机构
[1] Sandia Natl Labs, Dept 1113, Albuquerque, NM 87185 USA
关键词
metal-organic chemical vapor deposition; epitaxy; electron mobility; InSb;
D O I
10.1016/S0022-0248(99)00751-4
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We report the growth of InSb on GaAs using InAlSb buffers of high interest for magnetic field sensors. We have grown samples by metal-organic chemical vapor deposition consisting of similar to 0.55 mu m thick Insb layers with InAlSb buffers on GaAs substrates with measured electron mobilities of similar to 40000 cm(2)/V s. We have investigated the In1-xAlxSb buffers for compositions x less than or equal to 0.22 and have found that the best results are obtained near x = 0.12 due to the tradeoff of buffer layer band gap and lattice mismatch. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:567 / 571
页数:5
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