Design of multilayer extreme-ultraviolet mirrors for enhanced reflectivity

被引:52
作者
Singh, M [1 ]
Braat, JJM [1 ]
机构
[1] Delft Univ Technol, Fac Appl Phys, Opt Res Grp, NL-2628 CJ Delft, Netherlands
关键词
D O I
10.1364/AO.39.002189
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We show numerically that the reflectivity of multilayer extreme-UV (EUV) mirrors tuned for the 11-14-nm spectral region, for which the two-component, Mo/Be and Mo/Si multilayer systems with constant layer thickness are commonly used, can be enhanced significantly when we incorporate additional materials within the stack. The reflectivity performance of the quarter-wavelength multilayers can be enhanced further by global optimization procedures with which the layer thicknesses are varied far optimum performance. By incorporating additional materials of differing complex refractive indices-e.g., Rh, Ru, Sr, Pd, and RbCl-in various regions of the stack, we observed peak reflectivity enhancements of as much as similar to 5% for a single reflector compared with standard unoptimized stacks. We show that, in an EUV optical system with nine near-normal-incidence mirror surfaces, the optical throughput may be increased by a factor as great as 2. We also show that protective capping layers, in addition to protecting the mirrors from environmental attack, may serve to improve the reflectivity characteristics. (C) 2000 Optical Society of America.
引用
收藏
页码:2189 / 2197
页数:9
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