High-mobility field-effect transistors based on transition metal dichalcogenides

被引:512
作者
Podzorov, V [1 ]
Gershenson, ME
Kloc, C
Zeis, R
Bucher, E
机构
[1] Rutgers State Univ, Dept Phys & Astron, POB 849, Piscataway, NJ 08854 USA
[2] Bell Labs, Lucent Technol, Murray Hill, NJ 07974 USA
关键词
D O I
10.1063/1.1723695
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on fabrication of field-effect transistors (FETs) based on transition metal dichalcogenides. The unique structure of single crystals of these layered inorganic semiconductors enables fabrication of FETs with intrinsically low field-effect threshold and high charge carrier mobility, comparable to that in the best single-crystal Si FETs (up to 500 cm(2)/V s for the p-type conductivity in the WSe2-based FETs at room temperature). These FETs demonstrate ambipolar operation. Owing to mechanical flexibility, they hold potential for applications in "flexible" electronics. (C) 2004 American Institute of Physics.
引用
收藏
页码:3301 / 3303
页数:3
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