New transparent conducting thin films using multicomponent oxides composed of ZnO and V2O5 prepared by magnetron sputtering

New multicomponent transparent conducting oxide thin films have been prepared by both r.f. and d.c. magnetron sputtering using ZnO-V2O5 targets. A minimum resistivity of 5.3 X 10(-4) Omega cm, was obtained in ZnO:V films prepared by d.c. magnetron sputtering at a substrate temperature of 180 degreesC with a V content of 1 at.%. ZnO-V2O5 thin films prepared using targets with V contents from approximately 50 to 70 at.% were insulators identified as a ternary compound, ZnV2O4. The resistivity of ZnO-V2O5 films markedly decreased as the V content was increased above approximately 80 at.%. Vanadium oxide thin films with a thickness of 25 nm exhibited a resistivity of 5 X 10(-4) Omega cm and an average transmittance above 70% in the visible range. The film was very stable over 1000 h in a hydrochloric acid. (C) 2002 Elsevier Science B.V All rights reserved.