Sub 100 nm proton beam micromachining: theoretical calculations on resolution limits

被引：26

作者：

van Kan, JA ^{[1
]}

Sum, TC ^{[1
]}

Osipowicz, T ^{[1
]}

Watt, F ^{[1
]}

机构：

[1] Natl Univ Singapore, Dept Phys, Res Ctr Nucl Microscopy, Singapore 119260, Singapore

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2000年 / 161卷

关键词：

micromachining; nuclear microscope; high aspect ratio; proton beam;

D O I：

10.1016/S0168-583X(99)00862-9

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Proton beam micromachining is a novel direct-write process for the production of three-dimensional (3D) microstructures. A focused beam of MeV protons is scanned in a pre-determined pattern over a suitable resist material (e.g. PMMA or SU-8) and the latent image formed is subsequently developed chemically, In this paper calculations on theoretical resolution limits of proton beam micromachined three-dimensional microstructures are presented. Neglecting the finite beam size, a Monte Carlo ion transport code was used in combination with a theoretical model describing the delta-ray (delta-ray) energy deposition to determine the lateral energy deposition distribution in PMMA resist material. The energy deposition distribution of ion induced secondary electrons (delta-rays) has been parameterized using analytical models. It is assumed that the attainable resolution is limited by a convolution of the spread of the ion beam and energy deposition of the delta-rays. (C) 2000 Elsevier Science B.V. All rights reserved.

引用

页码：366 / 370

页数：5

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