Deposition of potential energy in solids by slow, highly charged ions

被引：45

作者：

Schenkel, T ^{[1
]}

Barnes, AV ^{[1
]}

Niedermayr, TR ^{[1
]}

Hattass, M ^{[1
]}

Newman, MW ^{[1
]}

Machicoane, GA ^{[1
]}

McDonald, JW ^{[1
]}

Hamza, AV ^{[1
]}

Schneider, DH ^{[1
]}

机构：

[1] Lawrence Livermore Natl Lab, Livermore, CA 94550 USA

来源：

PHYSICAL REVIEW LETTERS | 1999年 / 83卷 / 21期

关键词：

D O I：

10.1103/PhysRevLett.83.4273

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

We have measured the deposition of potential energy of slow (similar to 6 x 10(5) m/s), highly charged ions in solids with an ion implanted silicon detector. A large fraction (about 35% or 60 keV) of the potential energy dissipated by Au69+ ions can be traced in electronic excitations deep (>50 nm) inside the solid. In contrast, only about 10% of the potential energy has been accounted for in measurements of emitted secondary particles.

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页码：4273 / 4276

页数：4

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