Site-controlled self-organization of individual InAs quantum dots by scanning tunneling probe-assisted nanolithography

被引:129
作者
Kohmoto, S [1 ]
Nakamura, H [1 ]
Ishikawa, T [1 ]
Asakawa, K [1 ]
机构
[1] Femtosecond Technol Res Assoc, Tsukuba, Ibaraki 3002635, Japan
关键词
D O I
10.1063/1.125364
中图分类号
O59 [应用物理学];
学科分类号
摘要
A nanometer-scale site-control technique for individual InAs quantum dots (QDs) has been developed by using scanning tunneling microscope (STM) -assisted nanolithography and self-organizing molecular-beam epitaxy. We find that nanometer-scale deposits can be created on a GaAs surface by applying voltage and current pulses between the surface and a tungsten probe of the STM, and that they act as "nanomasks" on which GaAs does not grow directly. Accordingly, subsequent thin GaAs growth produces GaAs nanoholes above the deposits. By supplying 1.1 ML InAs on this surface, QDs are self-organized at the hole sites, while hardly any undesirable Stranski-Krastanov QDs are formed in the flat surface region. Using this technique with nanometer precision, a QD pair with 45 nm pitch is fabricated. (C) 1999 American Institute of Physics. [S0003-6951(99)03048-X].
引用
收藏
页码:3488 / 3490
页数:3
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