Depth resolution function of the laser assisted tomographic atom probe in the investigation of semiconductors

被引:70
作者
Cadel, Emmanuel [1 ]
Vurpillot, Francois [1 ]
Larde, Rodrigue [1 ]
Duguay, Sebastien [1 ]
Deconihout, Bernard [1 ]
机构
[1] Univ Rouen, Grp Phys Mat, CNRS, UMR 6634, F-76801 St Etienne De Rouvray, France
关键词
FIELD EVAPORATION; SPECIMEN PREPARATION; SILICON; RECONSTRUCTIONS;
D O I
10.1063/1.3186617
中图分类号
O59 [应用物理学];
学科分类号
070305 [高分子化学与物理];
摘要
The investigation of boron delta layers by tomographic atom probe (3DAP) is used to demonstrate that a depth profiling resolution of 0.9 nm (full width at half maximum) can be achieved. Results are compared with measurements provided by secondary ion mass spectrometry. The steepness is found to be below 1 nm/decade. In addition, silicon atomic planes are resolved in the real space demonstrating an in-depth spatial resolution of the 3DAP below 0.2 nm. (C) 2009 American Institute of Physics. [DOI: 10.1063/1.3186617]
引用
收藏
页数:6
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