New materials and deposition techniques for highly efficient silicon thin film solar cells

被引：118

作者：

Rech, B ^{[1
]}

Kluth, O ^{[1
]}

Repmann, T ^{[1
]}

Roschek, T ^{[1
]}

Springer, J ^{[1
]}

Müller, J ^{[1
]}

Finger, F ^{[1
]}

Stiebig, H ^{[1
]}

Wagner, H ^{[1
]}

机构：

[1] Forschungszentrum Julich, Inst Photovolta IPV, D-52425 Julich, Germany

来源：

SOLAR ENERGY MATERIALS AND SOLAR CELLS | 2002年 / 74卷 / 1-4期

关键词：

thin film solar cell; silicon; A-Si; mu c-Si; zinc oxide; TCO; PECVD; sputtering; high rate; tandem cell; light trapping; up-scaling;

D O I：

10.1016/S0927-0248(02)00114-9

中图分类号：

TE [石油、天然气工业]; TK [能源与动力工程];

学科分类号：

0807 ; 0820 ;

摘要：

This paper reviews recent efforts to provide the scientific and technological basis for cost-effective and highly efficient thin film solar modules based on amorphous (a-Si:H) and microcrystalline (pc-Si:H) silicon. Textured ZnO:Al films prepared by sputtering and wet chemical etching were applied to design optimised light-trapping schemes. Necessary prerequisite was the detailed knowledge of the relationship between film growth, structural properties and surface morphology obtained after etching. High rate deposition using plasma enhanced chemical vapour deposition at 13.56 MHz plasma excitation frequency was developed for pc-Si:H solar cells yielding efficiencies of 8.1% and 7.5% at deposition rates of 5 and 9 Angstrom/s, respectively. These pc-Si: H solar cells were successfully up-scaled to a substrate area of 30 x 30 cm(2) and applied in a-Si:H/muc-Si:H tandem cells showing initial test cell efficiencies up to 11.9%. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：439 / 447

页数：9

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