Divacancy annealing in Si: Influence of hydrogen

被引:25
作者
Monakhov, EV
Ulyashin, A
Alfieri, G
Kuznetsov, AY
Avset, BS
Svensson, BG
机构
[1] Univ Oslo, Dept Phys, N-0316 Oslo, Norway
[2] Fern Univ Hagen, D-58084 Hagen, Germany
[3] SINTEF, N-0314 Oslo, Norway
来源
PHYSICAL REVIEW B | 2004年 / 69卷 / 15期
关键词
D O I
10.1103/PhysRevB.69.153202
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have performed comparative studies of divacancy (V-2) annealing in hydrogenated and nonhydrogenated Si by deep level transient spectroscopy. It is shown that the nonhydrogenated samples demonstrate the formation of divacancy-oxygen (V2O) complex during annealing of V-2, while the hydrogenated samples demonstrate annealing of V-2 without correlated growth of electrically active centers. No substantial formation of divacancy-hydrogen (V2H) complexes is observed in the hydrogenated samples. It is suggested that the dominant mechanism of V-2 annealing in hydrogen-rich Si is the interaction with hydrogen molecules (H-2) that results in the formation of the V2H2 complex.
引用
收藏
页码:153202 / 1
页数:4
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