Experimental persistence probability for fluctuating steps

被引：57

作者：

Dougherty, DB ^{[1
]}

Lyubinetsky, I

Williams, ED

Constantin, M

Dasgupta, C

Das Sarma, S

机构：

[1] Univ Maryland, Mat Res Sci & Engn Ctr, Dept Phys, College Pk, MD 20742 USA

[2] Univ Maryland, Dept Phys, Condensed Matter Theory Ctr, College Pk, MD 20742 USA

来源：

PHYSICAL REVIEW LETTERS | 2002年 / 89卷 / 13期

关键词：

D O I：

10.1103/PhysRevLett.89.136102

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The persistence behavior for fluctuating steps on the Si(111)-(root3xroot3)R30degrees-Al surface was determined by analyzing time-dependent STM images for temperatures between 770 and 970 K. Using the standard persistence definition, the measured persistence probability displays power-law decay with an exponent of theta=0.77+/-0.03. This is consistent with the value of theta=3/4 predicted for attachment-detachment limited step kinetics. If the persistence analysis is carried out in terms of return to a fixed-reference position, the measured probability decays exponentially. Numerical studies of the Langevin equation used to model step motion corroborate the experimental observations.

引用

页码：136102 / 136102

页数：4

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