Mechanism of C2 hydrocarbon formation from methane in a pulsed microwave plasma

被引:109
作者
Heintze, M
Magureanu, M
Kettlitz, M
机构
[1] Inst Niedertemp Plasmaphys, D-17489 Greifswald, Germany
[2] Natl Inst Laser Plasma & Radiat Phys, R-76900 Bucharest, Romania
关键词
D O I
10.1063/1.1521518
中图分类号
O59 [应用物理学];
学科分类号
摘要
Methane dissociation, followed by the formation of C-2 hydrocarbons, in a pulsed microwave discharge in methane was investigated by mass spectrometry and optical emission spectroscopy (OES). Long microwave pulses (>200 mus) are characterized by a pronounced dehydrogenation, but have a disadvantage in the saturation of the methane conversion at relatively low values, due to methane depletion toward the end of the pulse. For shorter pulses, the conversion degree increases approximately linearly as a function of energy input, and a maximum conversion of 90% with 80% selectivity toward acetylene was obtained for 60 mus pulses at 1 kHz repetition frequency. A further decrease of the pulse duration (20 mus) at higher frequency, in order to ensure a similar energy input, resulted in a decrease in conversion and dehydrogenation. The explanation of the effect of the pulse duration is based on information provided by optical emission spectroscopy of active species generated in the discharge. Atomic hydrogen, formed by methane dissociation, was found to play an essential role in methane plasma chemistry. A qualitative estimation of the variation of H atom concentration with operating conditions was done by actinometry, since time-resolved OES provides evidence that atomic hydrogen is mainly formed in the ground state and dissociative excitation can be neglected. In addition to the concentration of atomic hydrogen, the second key parameter is the gas temperature. It was determined from the relative intensity distribution in the rotational structure of the (0,0) C-2 Swan band and of the (2,2) H-2 Fulcher-alpha band. Gas temperatures between 1500 and 2500 K were determined for the present discharge conditions. The hydrogen abstraction by hydrogen atoms, favored at high temperature, is responsible for the high methane conversion and low energy requirement achieved (9-10 eV/molecule) and for the distribution of the reaction products. (C) 2002 American Institute of Physics.
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页码:7022 / 7031
页数:10
相关论文
共 37 条
[1]  
[Anonymous], 1969, ROTATIONAL STRUCTURE
[2]   Radiative characteristics of 3p Sigma,Pi; 3d Pi(-),Delta(-) states of H-2 and determination of gas temperature of low pressure hydrogen containing plasmas [J].
Astashkevich, SA ;
Kaning, M ;
Kaning, E ;
Kokina, NV ;
Lavrov, BP ;
Ohl, A ;
Ropcke, J .
JOURNAL OF QUANTITATIVE SPECTROSCOPY & RADIATIVE TRANSFER, 1996, 56 (05) :725-751
[3]   EVALUATED KINETIC DATA FOR COMBUSTION MODELING [J].
BAULCH, DL ;
COBOS, CJ ;
COX, RA ;
ESSER, C ;
FRANK, P ;
JUST, T ;
KERR, JA ;
PILLING, MJ ;
TROE, J ;
WALKER, RW ;
WARNATZ, J .
JOURNAL OF PHYSICAL AND CHEMICAL REFERENCE DATA, 1992, 21 (03) :411-734
[4]   Rotational temperature measurements of excited and ground states of C2(d3Πg-a3Πu) transition in a H2/CH4 915 MHz microwave pulsed plasma [J].
Duten, X ;
Rousseau, A ;
Gicquel, A ;
Leprince, P .
JOURNAL OF APPLIED PHYSICS, 1999, 86 (09) :5299-5301
[5]  
Fridman A., 1991, P 10 INT S PLASM CHE, P1
[6]   Validation of actinometry for estimating relative hydrogen atom densities and electron energy evolution in plasma assisted diamond deposition reactors [J].
Gicquel, A ;
Chenevier, M ;
Hassouni, K ;
Tserepi, A ;
Dubus, M .
JOURNAL OF APPLIED PHYSICS, 1998, 83 (12) :7504-7521
[7]   OPTICAL-EMISSION CHARACTERIZATION OF CH4+H2 DISCHARGES FOR DIAMOND DEPOSITION [J].
GOMEZALEIXANDRE, C ;
SANCHEZ, O ;
CASTRO, A ;
ALBELLA, JM .
JOURNAL OF APPLIED PHYSICS, 1993, 74 (06) :3752-3757
[8]  
GONG A, 1997, P 13 INT S PLASM CHE, P1578
[9]   C2 swan band emission intensity as a function of C2 density [J].
Goyette, AN ;
Lawler, JE ;
Anderson, LW ;
Gruen, DM ;
McCauley, TG ;
Zhou, D ;
Krauss, AR .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1998, 7 (02) :149-153
[10]   Modeling of H2 and H2/CH4 moderate-pressure microwave plasma used for diamond deposition [J].
Hassouni, K ;
Leroy, O ;
Farhat, S ;
Gicquel, A .
PLASMA CHEMISTRY AND PLASMA PROCESSING, 1998, 18 (03) :325-362