Induced gate noise in MOSFETs revisited: The submicron case

被引:27
作者
Triantis, DP
Birbas, AN
Plevridis, SE
机构
[1] Dept. Elec. Eng. and Comp. Technol., University of Patras, Rion Campus, Patras
关键词
D O I
10.1016/S0038-1101(97)00178-0
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
At high frequencies the gate admittance of the MOSFET contains a conductive component because of the capacitive coupling of the gate electrode to the channel. The thermal noise fluctuations, originating in the channel, induce a gale current outwards from the gate electrode. Based on a proved two-region model for the drain current noise of a sub-micron MOSFET, it is shown that the calculated gate-noise current increases significantly, compared to that predicted by a classical model, valid for long channel devices. (C) 1997 Elsevier Science Ltd.
引用
收藏
页码:1937 / 1942
页数:6
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