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AN ENGINEERING MODEL FOR SHORT-CHANNEL MOS DEVICES
被引:99
作者
:
TOH, KY
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
TOH, KY
[
1
]
KO, PK
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
KO, PK
[
1
]
MEYER, RG
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
MEYER, RG
[
1
]
机构
:
[1]
UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
来源
:
IEEE JOURNAL OF SOLID-STATE CIRCUITS
|
1988年
/ 23卷
/ 04期
关键词
:
D O I
:
10.1109/4.346
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:950 / 958
页数:9
相关论文
共 9 条
[1]
A SIMPLE METHOD TO CHARACTERIZE SUBSTRATE CURRENT IN MOSFETS
CHAN, TY
论文数:
0
引用数:
0
h-index:
0
CHAN, TY
KO, PK
论文数:
0
引用数:
0
h-index:
0
KO, PK
HU, C
论文数:
0
引用数:
0
h-index:
0
HU, C
[J].
IEEE ELECTRON DEVICE LETTERS,
1984,
5
(12)
: 505
-
507
[2]
CURRENT-VOLTAGE CHARACTERISTICS OF SMALL SIZE MOS-TRANSISTORS
HOENEISEN, B
论文数:
0
引用数:
0
h-index:
0
HOENEISEN, B
MEAD, CA
论文数:
0
引用数:
0
h-index:
0
MEAD, CA
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1972,
ED19
(03)
: 382
-
+
[3]
KO P, 1982, THESIS U CALIF BERKE
[4]
LIANG MS, 1986, IEEE T ELECTRON DEV, V33, P409, DOI 10.1109/T-ED.1986.22502
[5]
SABINS AG, 1979, IEDM, P18
[6]
BSIM - BERKELEY SHORT-CHANNEL IGFET MODEL FOR MOS-TRANSISTORS
SHEU, BJ
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
SHEU, BJ
SCHARFETTER, DL
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
SCHARFETTER, DL
KO, PK
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
KO, PK
JENG, MC
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
JENG, MC
[J].
IEEE JOURNAL OF SOLID-STATE CIRCUITS,
1987,
22
(04)
: 558
-
566
[7]
THE EFFECT OF HIGH FIELDS ON MOS DEVICE AND CIRCUIT PERFORMANCE
SODINI, CG
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,HOLMDEL,NJ 07733
SODINI, CG
KO, PK
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,HOLMDEL,NJ 07733
KO, PK
MOLL, JL
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,HOLMDEL,NJ 07733
MOLL, JL
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1984,
31
(10)
: 1386
-
1393
[8]
Sze S. M., 1981, PHYS SEMICONDUCTOR D
[9]
VLSI LIMITATIONS FROM DRAIN-INDUCED BARRIER LOWERING
TROUTMAN, RR
论文数:
0
引用数:
0
h-index:
0
机构:
IBM General Technology Division, Essex Junction
TROUTMAN, RR
[J].
IEEE JOURNAL OF SOLID-STATE CIRCUITS,
1979,
14
(02)
: 383
-
391
←
1
→
共 9 条
[1]
A SIMPLE METHOD TO CHARACTERIZE SUBSTRATE CURRENT IN MOSFETS
CHAN, TY
论文数:
0
引用数:
0
h-index:
0
CHAN, TY
KO, PK
论文数:
0
引用数:
0
h-index:
0
KO, PK
HU, C
论文数:
0
引用数:
0
h-index:
0
HU, C
[J].
IEEE ELECTRON DEVICE LETTERS,
1984,
5
(12)
: 505
-
507
[2]
CURRENT-VOLTAGE CHARACTERISTICS OF SMALL SIZE MOS-TRANSISTORS
HOENEISEN, B
论文数:
0
引用数:
0
h-index:
0
HOENEISEN, B
MEAD, CA
论文数:
0
引用数:
0
h-index:
0
MEAD, CA
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1972,
ED19
(03)
: 382
-
+
[3]
KO P, 1982, THESIS U CALIF BERKE
[4]
LIANG MS, 1986, IEEE T ELECTRON DEV, V33, P409, DOI 10.1109/T-ED.1986.22502
[5]
SABINS AG, 1979, IEDM, P18
[6]
BSIM - BERKELEY SHORT-CHANNEL IGFET MODEL FOR MOS-TRANSISTORS
SHEU, BJ
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
SHEU, BJ
SCHARFETTER, DL
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
SCHARFETTER, DL
KO, PK
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
KO, PK
JENG, MC
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
JENG, MC
[J].
IEEE JOURNAL OF SOLID-STATE CIRCUITS,
1987,
22
(04)
: 558
-
566
[7]
THE EFFECT OF HIGH FIELDS ON MOS DEVICE AND CIRCUIT PERFORMANCE
SODINI, CG
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,HOLMDEL,NJ 07733
SODINI, CG
KO, PK
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,HOLMDEL,NJ 07733
KO, PK
MOLL, JL
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,HOLMDEL,NJ 07733
MOLL, JL
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1984,
31
(10)
: 1386
-
1393
[8]
Sze S. M., 1981, PHYS SEMICONDUCTOR D
[9]
VLSI LIMITATIONS FROM DRAIN-INDUCED BARRIER LOWERING
TROUTMAN, RR
论文数:
0
引用数:
0
h-index:
0
机构:
IBM General Technology Division, Essex Junction
TROUTMAN, RR
[J].
IEEE JOURNAL OF SOLID-STATE CIRCUITS,
1979,
14
(02)
: 383
-
391
←
1
→