THE EFFECT OF HIGH FIELDS ON MOS DEVICE AND CIRCUIT PERFORMANCE

被引:202
作者
SODINI, CG
KO, PK
MOLL, JL
机构
[1] BELL TEL LABS INC,HOLMDEL,NJ 07733
[2] HEWLETT PACKARD CO,PALO ALTO,CA 94304
关键词
D O I
10.1109/T-ED.1984.21721
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1386 / 1393
页数:8
相关论文
共 21 条
  • [1] Baccarani G., 1982, International Electron Devices Meeting. Technical Digest, P278
  • [2] CARRIER MOBILITIES IN SILICON EMPIRICALLY RELATED TO DOPING AND FIELD
    CAUGHEY, DM
    THOMAS, RE
    [J]. PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1967, 55 (12): : 2192 - +
  • [3] CHATTERJEE PK, 1980, ELECTRON DEVIC LETT, V1, P220
  • [4] CHERN GJ, 1980, IEEE ELECTRON DEVICE, V1, P170
  • [5] VELOCITY OF SURFACE CARRIERS IN INVERSION-LAYERS ON SILICON
    COEN, RW
    MULLER, RS
    [J]. SOLID-STATE ELECTRONICS, 1980, 23 (01) : 35 - 40
  • [6] COOPER JA, 1981, ELECTRON DEVIC LETT, V2, P171, DOI 10.1109/EDL.1981.25387
  • [7] DESIGN OF ION-IMPLANTED MOSFETS WITH VERY SMALL PHYSICAL DIMENSIONS
    DENNARD, RH
    GAENSSLEN, FH
    YU, HN
    RIDEOUT, VL
    BASSOUS, E
    LEBLANC, AR
    [J]. IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1974, SC 9 (05) : 256 - 268
  • [8] MOS DEVICE AND TECHNOLOGY CONSTRAINTS IN VLSI
    ELMANSY, Y
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1982, 29 (04) : 567 - 573
  • [9] Grove A S, 1967, PHYS TECHNOLOGY SEMI
  • [10] MODEL AND PERFORMANCE OF HOT-ELECTRON MOS-TRANSISTORS FOR VLSI
    HOEFFLINGER, B
    SIBBERT, H
    ZIMMER, G
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) : 513 - 520