Antireflection effect of self-organized GaN nanotip structure from ultraviolet to visible region

被引:14
作者
Yoshida, H [1 ]
Terada, Y [1 ]
Miyake, H [1 ]
Hiramatsu, K [1 ]
机构
[1] Mie Univ, Fac Engn, Dept Elect & Elect Engn, Tsu, Mie 5148507, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 2002年 / 41卷 / 10B期
关键词
GaN; antireflection effect; reflectance; transmittance; nanotip structure; rough surface;
D O I
10.1143/JJAP.41.L1134
中图分类号
O59 [应用物理学];
学科分类号
摘要
A self-organized GaN nanotip structure was fabricated by means of reactive ion etching using Cl-2 plasma. We have revealed. in Fourier transform analysis, that the self-organized nanotip structure has a two-dimensional isotropic distribution and broadhand structure frequencies of the nanotips with the most frequent spatial frequency Of 10.4 mum(-1). It has been found that the nanotip surface, which is a fine structure with periods smaller than the wavelength of light, provides antireflection and enhanced transmission effects from the ultraviolet to the visible region (330 nm-800 nm). These excellent antireflection performances of the GaN nanotip structure are of interest for optoelectronic applications in GaN-based devices.
引用
收藏
页码:L1134 / L1136
页数:3
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