Characterization of thin-film decoupling and high-frequency (Ba,Sr)TiO3 capacitors on Al2O3 ceramic substrates

被引:14
作者
Koutsaroff, IP
Bernacki, TA
Zelner, M
Cervin-Lawry, A
Jimbo, T
Suu, K
机构
[1] Gennum Corp, Burlington, ON L7L 5P5, Canada
[2] ULVAC Inc, Inst Semicond Technol, Shizuoka 4101231, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2004年 / 43卷 / 9B期
关键词
BST; MOD; CSD; RF sputter; thin film; capacitor; varactor; decoupling; microwave; tunability; loss tangent; commutation quality factor;
D O I
10.1143/JJAP.43.6740
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this paper we present the results of the characterization of parallel-plate thin-film (Ba1-xSrx)TiO3 (BST) capacitors, to demonstrate their suitability for use as decoupling capacitors (a capacitance as high as 0.34muF and a capacitance density of up to 70 fF/mum(2)) and as tunable RF components (a small capacitance from 0.5 pF to 16pF, a high tunability of 4.22:1 at 10 V and a capacitance density of up to 34fF/mum(2)). BST films of different compositions, (Ba0.7Sr0.3)TiO3 and (Ba0.5Sr0.5)TiO3, were grown by metal-organic decomposition (MOD) and RF magnetron reactive sputtering on Pt/TiOx/SiO2/Al2O3 ceramic substrates. For large capacitors (2.25 mm(2)), capacitance and tan E were measured at low frequencies (1 kHz) using an LCR meter. Smaller capacitors (16mum(2) to 961 mum(2)) were characterized in the frequency range of 0.01-20 GHz. Capacitance, tan delta and equivalent series resistance (ESR) were extracted from two port scattering parameters obtained using a vector network analyzer (VNA). The relationships between dielectric loss, tunability and commutation quality factor (CQF) vs BST composition and deposition conditions were outlined.
引用
收藏
页码:6740 / 6745
页数:6
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