Solution processed invisible all-oxide thin film transistors

被引:86
作者
Song, Keunkyu [1 ]
Kim, Dongjo [1 ]
Li, Xiang-Shu [2 ]
Jun, Taewhan [1 ]
Jeong, Youngmin [1 ]
Moon, Jooho [1 ]
机构
[1] Yonsei Univ, Dept Mat Sci & Engn, Seoul 120749, South Korea
[2] Samsung Adv Inst Technol, Analyt Engn Ctr, Suwon 440600, South Korea
关键词
INDIUM-OXIDE; ZINC; SEMICONDUCTOR;
D O I
10.1039/b912554j
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We report on a fully transparent solution processed thin-film transistor (TFT) device with oxide semiconductor and oxide electrode. Selective doping into the sol-gel derived ZnO materials tailors the electrical properties to range from metallic to semiconducting characteristics. Integration of a spin-coated zinc tin oxide (ZTO) semiconductor with an ink-jet-printed zinc indium oxide (ZIO) electrode creates a transparent TFT with high performance and good transparency (similar to 90%). Use of the same ZnO-based oxide materials in a TFT allows for the formation of good electrical contacts characterized by low contact resistance, comparable to those with a vacuum-deposited Al electrode. Our results suggest that the solution-processed ZnO-based TFT has great potential to work as a building block for future printed transparent electronics.
引用
收藏
页码:8881 / 8886
页数:6
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